Welcome to Liang Nano Research Group
Welcome to Liang Nano Research Group at Washington University in Saint Louis. We work at the intersection of physics, chemistry, and materials science. Our group uses Atomic/Molecular Layer Deposition (ALD/MLD) to design and synthesize nanostructured materials for various applications including important chemical reactions, energy conversion and storage, and environmental remediation. ALD/MLD is a thin film growth technique based on sequential, self-limiting surface chemical reactions and allows for precise deposition of ultra-thin, highly conformal coatings over complex 3D topography structures, with excellent control over stoichiometry and properties. The value in applying this thin film coating technology is to enable to harness the unexpected phenomena that result from the changes in structure and chemistry which occur over atomic scales at surfaces or interfaces. Please visit our Research and Publications pages to learn more about our research.